Low damage etching of InGaAs/AlGaAs by the electron cyclotron resonance plasma with Cl2/He mixture for heterojunction bipolar transistors
- 1 March 1994
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 12 (2) , 530-535
- https://doi.org/10.1116/1.587033
Abstract
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