The depth dependence of the depth resolution in sputter profiling
- 1 February 1982
- journal article
- research article
- Published by Wiley in Surface and Interface Analysis
- Vol. 4 (1) , 1-7
- https://doi.org/10.1002/sia.740040102
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Optimized depth resolution in ion-sputtered and lapped compositional profiles with Auger electron spectroscopyThin Solid Films, 1981
- Quantitative depth profiling in surface analysis: A reviewSurface and Interface Analysis, 1980
- Introduction to Secondary Ion Mass Spectrometry (SIMS)Published by Springer Nature ,1978
- Applications of Secondary Ion Mass Spectrometry (SIMS)Published by Springer Nature ,1977
- Evaluation of concentration-depth profiles by sputtering in SIMS and AESApplied Physics A, 1976
- Elemental composition profiling in thin films by glow-discharge mass spectrometry: Depth resolutionJournal of Applied Physics, 1975
- Theoretical and experimental aspects of secondary ion mass spectrometryVacuum, 1974
- Investigation of Solids by Means of an Ion-Bombardment Mass SpectrometerPublished by Springer Nature ,1969