Decomposition of fluorocarbon gaseous contaminants by surface discharge-induced plasma chemical processing
- 1 January 1993
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Industry Applications
- Vol. 29 (4) , 787-792
- https://doi.org/10.1109/28.231995
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Electrostatic deposition of CVD particles for fabrication of ultrafine ceramic filterIEEE Transactions on Industry Applications, 1991
- A ceramic-based ozonizer using high-frequency dischargeIEEE Transactions on Industry Applications, 1988
- Chemical Decomposition and Pressure Rise in Gaseous and Liquid C2Cl3F3 Under Internal Arc StressIEEE Transactions on Electrical Insulation, 1985