On the pathways of aerosol formation by thermal decomposition of silane
- 1 March 1997
- journal article
- Published by Elsevier in Journal of Aerosol Science
- Vol. 28 (2) , 207-222
- https://doi.org/10.1016/s0021-8502(96)00061-4
Abstract
No abstract availableKeywords
This publication has 57 references indexed in Scilit:
- Some mechanistic problems in the kinetic modeling of monosilane pyrolysisThe Journal of Physical Chemistry, 1992
- Nuclear magnetic resonance investigation of H, H2 and dopants in hydrogenated amorphous silicon and related materialsPhysica B: Condensed Matter, 1991
- Amorphous-Silicon Thin-Film Transistors Using Chemical Vapor Deposition of DisilaneJapanese Journal of Applied Physics, 1990
- Chemical Vapor Deposition of Hydrogenated Amorphous Silicon from DisilaneJournal of the Electrochemical Society, 1989
- Mechanism of formation of tri- and tetrasilane in the reaction of atomic hydrogen with monosilane and the thermochemistry of the disilene isomersThe Journal of Physical Chemistry, 1987
- Gas-phase silicon atoms in silane chemical vapor deposition: Laser-excited fluorescence measurements and comparisons with model predictionsJournal of Applied Physics, 1986
- Comparisons between a gas-phase model of silane chemical vapor deposition and laser-diagnostic measurementsJournal of Applied Physics, 1986
- Structure and crystal growth of atmospheric and low-pressure chemical-vapor-deposited silicon filmsJournal of Applied Physics, 1986
- The role of hydrogen in a-Si:H — results of evolution and annealing studiesJournal of Non-Crystalline Solids, 1983
- Temperature dependence of the growth rate of silicon prepared through chemical vapor deposition from silaneApplied Physics Letters, 1982