Process Integration for a 2ns Cycle/4ns Access 512K CMOS SRAM

Publisher Website

1 January 1991

conference paper
Published by Institute of Electrical and Electronics Engineers (IEEE)

p. 31-32
https://doi.org/10.1109/vlsit.1991.705975

Abstract

No abstract available

Keywords

This publication has 1 reference indexed in Scilit:

A process for improved Al(Cu) reactive ion etching
Journal of Vacuum Science & Technology A, 1989