An Investigation of Phosphorus Transient Diffusion in Silicon Below the Solid Solubility Limit and at a Low Implant Energy
- 1 August 1994
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 141 (8) , 2182-2188
- https://doi.org/10.1149/1.2055083