The effect of deposition and processing variables on the oxide structure of MCrAl coatings
- 1 September 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 107 (4) , 463-472
- https://doi.org/10.1016/0040-6090(83)90308-5
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Improvements in high temperature oxidation resistance by additions of reactive elements or oxide dispersionsPhilosophical Transactions of the Royal Society of London. Series A, Mathematical and Physical Sciences, 1980
- Electron beam evaporation of low vapor pressure elements in MCrAl coating compositionsThin Solid Films, 1979
- Improvements in oxidation resistance by dispersed oxide addition: Al2O3-forming alloysOxidation of Metals, 1979
- Some effects of structure and composition on the properties of electron beam vapor deposited coatings for gas turbine superalloysJournal of Vacuum Science and Technology, 1974
- The oxidation of TD NiC (Ni-20Cr-2 vol pct ThO2) between 900° and 1200°CMetallurgical Transactions, 1971