Direct imprint of sub-10nm features into metal using diamond and SiC stamps
- 1 November 2004
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 22 (6) , 3257-3259
- https://doi.org/10.1116/1.1825010
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Imprint lithography for integrated circuit fabricationJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2003
- The use of materials patterned on a nano- and micro-metric scale in cellular engineeringMaterials Science and Engineering: C, 2002
- Sub-10 nm Linewidth and Overlay Performance Achieved with a Fine-Tuned EBPG-5000 TFE Electron Beam Lithography SystemJapanese Journal of Applied Physics, 2000
- Nanoscale embossing of polymers using a thermoplastic dieMicroelectronic Engineering, 1999
- Direct nano-printing on Al substrate using a SiC moldJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- Nano-patterning of a hydrogen silsesquioxane resist with reduced linewidth fluctuationsMicroelectronic Engineering, 1998
- Physical approximants to electron scatteringMicroelectronic Engineering, 1997
- A Review of SiC Reactive Ion Etching in Fluorinated PlasmasPhysica Status Solidi (b), 1997
- Imprint of sub-25 nm vias and trenches in polymersApplied Physics Letters, 1995