Characterization of thin film thickness and density by low angle X-ray interference
- 31 July 1967
- journal article
- Published by Elsevier in Materials Research Bulletin
- Vol. 2 (7) , 509-522
- https://doi.org/10.1016/0025-5408(67)90072-4
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Adaptation of an X-Ray Diffractometer for Thin Film Studies by Total Reflection of X RaysReview of Scientific Instruments, 1964
- X-Ray Reflection Studies of the Anneal and Oxidation of Some Thin Solid FilmsJournal of Applied Physics, 1960
- Density Measurements of Some Thin Copper FilmsJournal of Applied Physics, 1959
- Surface Studies of Solids by Total Reflection of X-RaysPhysical Review B, 1954
- The Thickness Measurement of Thin Films by Multiple Beam InterferometryJournal of Applied Physics, 1950