Pulse-modulated microwave plasma etching
- 15 July 1991
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 70 (2) , 1039-1041
- https://doi.org/10.1063/1.349689
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Analysis of a Pulsed‐Plasma Chemical Vapor Deposition Reactor with RecycleJournal of the Electrochemical Society, 1990
- A model for the etching of silicon in SF6/O2 plasmasPlasma Chemistry and Plasma Processing, 1990
- A Verastile Microwave Plasama ApplicatorJournal of Microwave Power and Electromagnetic Energy, 1988
- Etching in a pulsed plasmaJournal of Applied Physics, 1987
- Enhancement of the plasma density and deposition rate in rf dischargesApplied Physics Letters, 1986
- Pulsed high rate plasma etching with variable Si/SiO2 selectivity and variable Si etch profilesApplied Physics Letters, 1985