Variable spot shaping for electron-beam lithography

Publisher Website
Google Scholar
Abstract
Spot size and shape can be changed rapidly, without loss of resolution and current density, by use of the probe-forming electron-beam system described here. The variable-shaped spot (VSS) method is an extension of the fixed-shaped-beam concept. It further increases the exposure rate, projecting up to 100 or more image points in parallel, and provides more flexible pattern generation. The beam spot at the target is tailored to fit each pattern segment while it steps from one segment to the next. Spots are shaped by projecting two square apertures simultaneously, and by laterally shifting the image of the first aperture electrostatically with respect to the second. The compound image is subsequently demagnified and projected onto the target. The feasibility of this VSS method has been demonstrated experimentally.

This publication has 0 references indexed in Scilit: