Thin Tunnelable Layers of Silicon Dioxide Formed by Oxidation of Silicon

• 1 January 1970
• journal article
• Published by The Electrochemical Society in Journal of the Electrochemical Society
• Vol. 117  (7) , 982-984
• https://doi.org/10.1149/1.2407703

Abstract

Keywords

• SILICON
• OXIDATION
• THIN FILMS
• TUNNELLING
• THICKNESS CONTROL
• FURNACES
• FILM CONDENSATION