Tunability of one-dimensional self-faceting on GaAs (311)A surfaces by metalorganic vapor-phase epitaxy
- 27 June 1994
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 64 (26) , 3557-3559
- https://doi.org/10.1063/1.111196
Abstract
The controlled step bunching on GaAs (311)A oriented surfaces during growth by metalorganic vapor‐phase epitaxy(MOVPE) leads to one‐dimensional faceting with a lateral period tunable upon growth temperature and layer thickness in the mesoscopic size range 25–80 nm. The surface morphology established during MOVPEgrowth directly images the microscopic surface structure maintained during growth by conventional solid sourcemolecular beam epitaxy(MBE) and allows us to control the lateral period in GaAs/AlGaAs wire‐like heterostructures. The red shift of the luminescence at room temperature from these structures is directly correlated with the lateral period of faceting.Keywords
This publication has 14 references indexed in Scilit:
- Overlayer strain: A key to directly tune the topography of high-index semiconductor surfacesApplied Physics Letters, 1993
- Kinetic surface roughening in molecular beam epitaxy of InPPhysical Review Letters, 1993
- Equilibrium multiatomic step structure of GaAs(001) vicinal surfaces grown by metalorganic chemical vapor depositionApplied Physics Letters, 1993
- Topography of high- and low-index GaAs surfacesPhysical Review B, 1992
- Semiconductor quantum-wire structures directly grown on high-index surfacesPhysical Review B, 1992
- MBE growth of AlGaAs/GaAs superlattices on GaAs (110) substratesSuperlattices and Microstructures, 1990
- Distributions of growth rates on patterned surfaces measured by scanning microprobe reflection high-energy electron diffractionJournal of Vacuum Science & Technology B, 1990
- Ideal Crystal Growth from Kink Sites on a GaAs Vicinal Surface by Metalorganic Chemical Vapor DepositionJapanese Journal of Applied Physics, 1990
- Natural Superstep Formed on GaAs Vicinal Surface by Metalorganic Chemical Vapor DepositionJapanese Journal of Applied Physics, 1990
- The evaluation of growth dynamics in MBE using electron diffractionJournal of Crystal Growth, 1990