Low resistance indium tin oxide films on large scale glass substrate

Publisher Website
Google Scholar
Abstract
Preparation of low resistance indium tin oxide (ITO) films on large scale glass substrate has been studied for architectural applications. Coatings were carried out by a plasma enhanced deposition technique using sintered ITO pellets as the starting material and high deposition rate of more than 4000 Å/min was achieved. Scanning tunneling microscopy observation revealed that surface morphology of the thick (about 1 μm) film was strongly dependent on the substrate temperature. Crystallinity and electrical properties were also dependent on the temperature and closely related to the surface morphology. The films deposited on 125 °C substrate were composed of a mixture of amorphous and polycrystalline phases and showed a hazy appearance caused by light scattering at the rough surface. The polycrystalline ITO films with a clean and transparent appearance as well as the minimum resistivity of 1.7 × 10−4 Ω cm were obtained on 180 °C substrate. Coatings on architectural size glass substrate (1.8 m×3.2 m) were carried out and minimum sheet resistance of less than 1.25 Ω/sq was obtained. Sheet resistance less than 2 Ω/sq was observed over 88% of the surface area. The transparency and durability of the film were confirmed to be enough for practical use.

This publication has 0 references indexed in Scilit: