Chlorine Concentration Profiles in O 2 / HCl and H 2 O / HCl Thermal Silicon Oxides Using SIMS Measurements
- 1 December 1978
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 125 (12) , 2024-2027
- https://doi.org/10.1149/1.2131356
Abstract
No abstract availableThis publication has 0 references indexed in Scilit: