Fabrication of conductometric gas-sensing films by selected area chemical-vapor deposition

• 1 January 1997
• journal article
• research article
• Published by Wiley in AIChE Journal
• Vol. 43  (S11) , 2760-2764
• https://doi.org/10.1002/aic.690431322

Abstract

Keywords

• CVD
• THIN
• CONDUCTOMETRIC
• FABRICATION
• VAPOR
• STRUCTURE
• SILICON
• GAS SENSING
• MICROMACHINING