Boron Diffusion in Strained and Relaxed Si1-xGex

• 19 April 2001
• journal article
• Published by Trans Tech Publications, Ltd. in Defect and Diffusion Forum
• Vol. 194-199, 703-708
• https://doi.org/10.4028/www.scientific.net/ddf.194-199.703

Abstract

Keywords

• BORON
• DIFFUSION
• SILICON
• SILICON-GERMANIUM (SIGE)
• STRAIN