Structures and magnetic properties of Fe/Ag multilayer films prepared by sputtering and ultrahigh-vacuum depositions

Publisher Website
Google Scholar
Abstract
Fe/Ag multilayer films were prepared by rf-magnetron sputtering and ultrahigh-vacuum (UHV) depositions. The Ag layer thickness dAg was 2 nm constant, and the Fe layer thickness dFe was changed from 1 to 40 nm. The relationships between film structures and magnetic properties were investigated. The periodicity of multilayer films by UHV deposition is superior to that of sputtered films. The crystal orientation of sputtered films is Fe(110)∥Ag(111) for dFe less than 7.3 nm, and Fe(110)∥Ag(200) for dFe more than 14.7 nm. The critical thickness of dFe corresponds to the continuity of the Fe layer. When the crystal orientation is Fe(110)∥Ag(200), the saturation magnetic flux density Bs(T) is about 2.1 T, and the coercive force Hc is less than 2 Oe. When the films are Fe(110)∥Ag(111), Bs sharply decreases and Hc increases with decreasing dFe. The crystal orientation of UHV deposition films is Fe(110)∥Ag(200) in the range of dFe=2–40 nm. Bs of UHV deposition films is about 2.0 T constant and Hc decreases with decreasing dFe.