High voltage electron beam lithography of the resolution limits of SAL 601 negative resist
- 31 March 1992
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 17 (1-4) , 21-24
- https://doi.org/10.1016/0167-9317(92)90007-e
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Nanolithography at 350 KV in a TEMMicroelectronic Engineering, 1989