Formation of Organic Polymer-Containing Gel Films and Their Application to the Fine-Patterning Process

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Abstract
The influences of a variety of organic polymers on the properties of the resultant gel films have been studied in the system B2O3-SiO2, with the aim of the application of these gel films to the fine-patterning process. Among the polymers examined, polyether glycols such as polyethylene glycol and polytetramethylene glycol were found to be the most suitable for the patterning process. These compounds are considered to soften effectively the resultant gel films, which enables one to leave patterns on the films. The addition of polyether glycols had no bad influences on the optical properties of the finally obtained glass films, since the additives had been eliminated completely during the heat-treatment. The newly-developed process is applicable to the formation of fine-patterns in submicrons.

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