Extreme asymmetric X-ray Bragg reflection of semiconductor heterostructures near the edge of total external reflection
- 1 August 1990
- journal article
- Published by International Union of Crystallography (IUCr) in Journal of Applied Crystallography
- Vol. 23 (4) , 228-233
- https://doi.org/10.1107/s0021889890001704
Abstract
No abstract availableKeywords
This publication has 0 references indexed in Scilit: