Development and Applications of a Compact Electron Cyclotron Resonance Source
- 1 November 1991
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 30 (11S) , 3164
- https://doi.org/10.1143/jjap.30.3164
Abstract
A new compact ECR plasma source has been developed. The characteristics of this source and it's applications are discussed. Irradiation by oxygen radicals O* for the oxidation during deposition process was found to produce high quality superconducting thin films with increased characteristic temperatures. Hydrogen radical H* beam cleaning of GaAs substrate surfaces was achieved at temperatures as low as 100°C.Keywords
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