Advantages of Fluorine Introduction in Boron Implanted Shallow p+/n-Junction Formation
- 1 March 1990
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 29 (3R)
- https://doi.org/10.1143/jjap.29.457
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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