Crystallization, resistivity and microstructure of co-deposited metal-silicon thin film alloys
- 31 December 1987
- journal article
- Published by Elsevier in Ultramicroscopy
- Vol. 23 (3-4) , 405-410
- https://doi.org/10.1016/0304-3991(87)90251-8
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Effect of temperature on electrical and microstructural changes of coevaporated Ir-Si alloy filmsJournal of Applied Physics, 1986
- Metastable evaporated thin films of CuAg AND CoAu alloys—II kinetics of the transformationsActa Metallurgica, 1967
- Metastable evaporated thin films of CuAg and CoAu alloys—I occurrence and morphology of phasesActa Metallurgica, 1967