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UV–Ozone Cleaning of GaAs for MBE
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UV–Ozone Cleaning of GaAs for MBE
UV–Ozone Cleaning of GaAs for MBE
JM
J. A. McClintock
J. A. McClintock
RW
R. A. Wilson
R. A. Wilson
NB
N. E. Byer
N. E. Byer
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1 February 1982
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science and Technology
Vol. 20
(2)
,
241-242
https://doi.org/10.1116/1.571365
Abstract
A simple method of removing carbon contamination from GaAs substrates using exposure to ozone and ultraviolet light is described.
Keywords
CONTAMINATION
OZONE CLEANING
SUBSTRATES
MBE
ULTRAVIOLET
REMOVING
CLEANING OF GAAS
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