Synthesis of Si and Ge Nitrides and Si Oxynitride by Ammonolysis of Chlorides—Comment on “Synthesis, Characterization, and Consolidation of Si3N4 Obtained from Ammonolysis of SiCl4”
- 1 May 1975
- journal article
- Published by Wiley in Journal of the American Ceramic Society
- Vol. 58 (5-6) , 254
- https://doi.org/10.1111/j.1151-2916.1975.tb11457.x
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Electrical Properties of Vapor-Deposited Silicon Nitride and Silicon Oxide Films on SiliconJournal of the Electrochemical Society, 1968
- Preparation and Properties of Amorphous Germanium Nitride FilmsJournal of the Electrochemical Society, 1968
- Silicon Nitride Thin Films from SiCl[sub 4] Plus NH[sub 3]: Preparation and PropertiesJournal of the Electrochemical Society, 1968
- The Preparation and Properties of Amorphous Silicon Nitride FilmsJournal of the Electrochemical Society, 1967