Plasma‐Enhanced Chemical Vapor Deposition of Organosilicon Thin Films from Tetraethoxysilane‐Oxygen Feeds
- 1 September 1992
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 139 (9) , 2636-2644
- https://doi.org/10.1149/1.2221277
Abstract
The composition of films deposited in RF glow discharges fed with tetraethoxysilane and oxygen mixtures has been investigated by means of in situ x‐ray photoelectron spectroscopy and infrared spectroscopy. These results, combined with mass spectrometric investigations of the gas phase, indicate that the overall deposition consists of several concurrent heterogeneous and homogeneous reactions.Keywords
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