Studies of reactive ion etching using Colutron hot filament dc plasma ion sources
- 1 January 1993
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 80-81, 1002-1005
- https://doi.org/10.1016/0168-583x(93)90725-l
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Surface science aspects of etching reactionsSurface Science Reports, 1992
- Construction, characterization and applications of a compact mass-resolved low-energy ion beam systemNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1991
- Reactive-Ion EtchingPhysics Today, 1986
- Chlorine abstraction reactions of fluorine. Part 3.—Thermochemical data for chlorofluoroalkanesJournal of the Chemical Society, Faraday Transactions 1: Physical Chemistry in Condensed Phases, 1972