Pulsed magnetron sputter technology
- 1 December 1993
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 61 (1-3) , 331-337
- https://doi.org/10.1016/0257-8972(93)90248-m
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Improved control of TiN coating properties using cathodic arc evaporation with a pulsed biasSurface and Coatings Technology, 1991
- A magnetron sputter ion plating systemSurface and Coatings Technology, 1988
- Reactive d.c. high-rate sputtering as production technologySurface and Coatings Technology, 1987
- High rate reactive sputtering process controlSurface and Coatings Technology, 1987
- TiN hard coatings deposited on high-speed steel substrates by reactive direct current magnetron sputteringJournal of Vacuum Science & Technology A, 1987
- Charged particle fluxes from planar magnetron sputtering sourcesJournal of Vacuum Science & Technology A, 1986
- The role of plasmatron/magnetron systems in physical vapor deposition techniquesThin Solid Films, 1978
- Optical spectroscopy for diagnostics and process control during glow discharge etching and sputter depositionJournal of Vacuum Science and Technology, 1978