Free volume and relaxation effects in polymer layers: application to the spin coating and bake processes
- 1 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1-4) , 469-472
- https://doi.org/10.1016/0167-9317(90)90153-k
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Characterization of thin films and materials used in semiconductor technology by spectroscopic ellipsometryThin Solid Films, 1988
- Dissolution And Swelling Studies Of Poly(Methyl Methacrylate) Resist FilmsPublished by SPIE-Intl Soc Optical Eng ,1987
- Highly Sensitized Electron-Beam Resist By Means Of A Quenching ProcessPublished by SPIE-Intl Soc Optical Eng ,1987