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Preparation and Properties of SiO2 Films from SiH4 ‐ CO 2 ‐ H 2
Home
Publications
Preparation and Properties of SiO2 Films from SiH4 ‐ CO 2 ‐ H 2
Preparation and Properties of SiO2 Films from SiH4 ‐ CO 2 ‐ H 2
AG
A. K. Gaind
A. K. Gaind
GA
G. K. Ackermann
G. K. Ackermann
VL
V. J. Lucarini
V. J. Lucarini
RB
R. L. Bratter
R. L. Bratter
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1 January 1976
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 123
(1)
,
111-117
https://doi.org/10.1149/1.2132741
Abstract
No abstract available
Cited
Cited by 9 articles
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