Use of Low-Temperature Deposited Silicon Dioxide Films As Diffusion Masks in GaAs

• 1 January 1964
• journal article
• Published by The Electrochemical Society in Journal of the Electrochemical Society
• Vol. 111  (1) , 120-122
• https://doi.org/10.1149/1.2426047

Abstract

Keywords

• SILICON DIOXIDE
• LOW TEMPERATURE
• GAAS
• DIOXIDE FILMS
• DEPOSITED SILICON
• TEMPERATURE DEPOSITED
• DIFFUSION MASKS