Direct UV patterning of thick hybrid glass filmsfor micro-opto-mechanical structures
- 16 March 2000
- journal article
- Published by Institution of Engineering and Technology (IET) in Electronics Letters
- Vol. 36 (6) , 530-531
- https://doi.org/10.1049/el:20000429
Abstract
The hybrid sol-gel method is applied to the fabrication of optical and mechanical structures into a photosensitive glass material. High optical quality thick films and structures are fabricated by a one-step spin-coating process followed by direct UV imprinting. A material thickness of 27.5 µm and a maximum patterned thickness of 17.4 µm at an aspect ratio of 0.6 have been achieved. The material exhibits a minimum transmittance of 97% between 400 and 1100 nm, a refractive index of 1.49, and an RMS surface roughness of 14.8 nm after development.Keywords
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