FTIR Studies of the Adsorption/Desorption Behavior of Cu Chemical Vapor Deposition Precursors on Silica: III . Re‐examination of (1,1,1,5,5,5‐hexafluoroacetylacetonato)(vinyltrimethylsilane)copper(I),
- 1 December 1994
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 141 (12) , 3539-3546
- https://doi.org/10.1149/1.2059367
Abstract
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