Quasisimultaneous SIMS, AES, XPS, and TDMS study of preferential sputtering, diffusion, and mercury evaporation in CdxHg1−xTe
- 2 March 1981
- journal article
- Published by Elsevier in Surface Science
- Vol. 104 (2-3) , 365-383
- https://doi.org/10.1016/0039-6028(81)90066-2
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
- Sputter cleaning and dry oxidation of CdTe, HgTe, and Hg0.8Cd0.2Te surfacesSurface Science, 1980
- Combined SIMS, AES, and XPS investigations of tantalum oxide layersApplied Physics A, 1979
- Contamination of clean metal surfaces associated with electron bombardment in conventional AES analysisJournal of Electron Spectroscopy and Related Phenomena, 1978
- Static aes-the adequate mode of aes for surface reaction and submonolayer adsorption studiesJournal of Electron Spectroscopy and Related Phenomena, 1978
- The influence of preferential enhanced diffusion on composition changes in sputtered binary solidsRadiation Effects, 1978
- The influence of selective sputtering on surface compositionSurface Science, 1976
- Hartree-Slater subshell photoionization cross-sections at 1254 and 1487 eVJournal of Electron Spectroscopy and Related Phenomena, 1976
- Developments in secondary ion mass spectroscopy and applications to surface studiesSurface Science, 1975
- Elucidation of surface structure and bonding by photoelectron spectroscopy?Surface Science, 1975
- Beobachtung von oberflächenreaktionen mit der statischen methode der sekundärionen-massenspektroskopie. I die methodeSurface Science, 1971