High-speed single-layer-resist process and energy-dependent aspect ratios for 0.2-μm electron-beam lithography
- 1 November 1994
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 12 (6) , 3874-3878
- https://doi.org/10.1116/1.587566
Abstract
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