Normal-state resistance fluctuations in high-cuprate films
- 1 February 1994
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 49 (5) , 3679-3682
- https://doi.org/10.1103/physrevb.49.3679
Abstract
We have measured 1/f resistance fluctuations at room temperature in films as a function of oxygen content, x. The films were single phase, c-axis oriented and grown by pulsed organometallic-beam epitaxy on substrates. In contrast to the monotonic increase of the film resistance with decreasing x, the normalized noise power was found to exhibit a sharp minimum at x=6.5. We attribute this behavior to vacancy creation in the Cu-O chains and discuss a simple model based on parallel conduction paths through both chains and planes.
Keywords
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