Neuron Adhesion on a Silicon Chip Probed by an Array of Field-Effect Transistors
- 8 January 1996
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 76 (2) , 327-330
- https://doi.org/10.1103/physrevlett.76.327
Abstract
The interaction of an individual nerve cell with a surface of oxidized silicon is studied. ac voltages from 0.1 to 5000 Hz are applied to the neuron. The resulting voltage profiles in the cleft between cell membrane and surface are recorded by an array of sixteen field-effect transistors with open metal-free gate oxide. Using methods of the cable theory to describe the contact area (diameter around 35 μm), we evaluate the width of the cleft (around 20 nm) and the conductance of the membrane, which is enhanced by an order of magnitude.Keywords
This publication has 5 references indexed in Scilit:
- Self-focusing of ion channels in cell adhesionPhysical Review E, 1995
- Neuron transistor: Electrical transfer function measured by the patch-clamp techniquePhysical Review Letters, 1993
- A Neuron-Silicon Junction: A Retzius Cell of the Leech on an Insulated-Gate Field-Effect TransistorScience, 1991
- Voltage dependence of 5‐hydroxytryptamine release at a synapse between identified leech neurones in culture.The Journal of Physiology, 1986
- Improved patch-clamp techniques for high-resolution current recording from cells and cell-free membrane patchesPflügers Archiv - European Journal of Physiology, 1981