Silylated positive tone resists for EUV lithography at 14 nm
- 1 January 1994
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 23 (1-4) , 279-282
- https://doi.org/10.1016/0167-9317(94)90155-4
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Resist schemes for soft x-ray lithographyPublished by SPIE-Intl Soc Optical Eng ,1991
- Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μmJournal of Vacuum Science & Technology B, 1990