R.F. and D.C. reactive sputtering for crystalline and amorphous VO2 thin film deposition
- 1 October 1972
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 12 (2) , 231-234
- https://doi.org/10.1016/0040-6090(72)90081-8
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Suppression of the semiconductor-metal transition in vanadium oxidesJournal of Non-Crystalline Solids, 1969
- Growth and electrical properties of vanadium dioxide single crystals containing selected impurity ionsJournal of Physics and Chemistry of Solids, 1969
- Oxides Which Show a Metal-to-Insulator Transition at the Neel TemperaturePhysical Review Letters, 1959