e −-beam deposition of In2O3 stabilized ZrO2 films
- 1 May 1991
- journal article
- research article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 9 (3) , 510-511
- https://doi.org/10.1116/1.577398
Abstract
Films of ZrO2-In2O3 were deposited by coevaporating ZrO2 and In2O3 using electron beam deposition techniques. During the deposition, the substrate was heated to 300-degrees-C. Postdeposition x-ray diffraction analyses showed that as-deposited films containing an In2O3 mole fraction ranging between 3.5 and 11.0 were crystalline with the zirconia in the cubic phase.This publication has 0 references indexed in Scilit: