Generation of subquarter-micron resist structures using optical interference lithography and image reversal
- 1 November 1997
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 15 (6) , 1949-1953
- https://doi.org/10.1116/1.589583
Abstract
We show that by using interference lithography coupled with image reversal techniques we can generate resist structures ranging from one-dimensional gratings to two-dimensional arrays of posts and holes. These resist structures have high aspect ratios and nearly vertical sidewalls. The structure dimensions are accurately controlled by varying the exposure dose. These structures play critical roles in the generation of subwavelength structured surfaces for optical applications.This publication has 18 references indexed in Scilit:
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