Methylated poly(4-hydroxystyrene): A new resin for deep-ultraviolet resist application

• 1 November 1990
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B
• Vol. 8  (6) , 1466-1469
• https://doi.org/10.1116/1.585098

Abstract

Keywords

• HYDROXYSTYRENE
• METHYLATED POLY
• RESIST APPLICATION
• NEW RESIN
• DEEP ULTRAVIOLET
• ULTRAVIOLET RESIST