Plasma return current discharge
- 15 September 1978
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 33 (6) , 487-489
- https://doi.org/10.1063/1.90434
Abstract
A discharge technique based on the use of an electron‐beam‐induced plasma return current to produce and heat large‐volume plasmas is described. The results of discharge studies using this technique in attachment‐dominated mixtures are presented. The results are found to be adequately described by a simple theory. The electron attachment rate by F2 inferred from these measurements agrees well with those of other workers. KrF laser action at 248 nm is reported in return‐current discharge‐excited mixtures of F2/Kr/He.Keywords
This publication has 5 references indexed in Scilit:
- Electron attachment in dilute fluorine-helium mixturesApplied Physics Letters, 1978
- Dissociative attachment of electrons to F2Applied Physics Letters, 1977
- Dissociative electron attachment in xenon difluorideThe Journal of Chemical Physics, 1976
- Theory of Plasma Electron Contribution to the Electron-Beam—Excited Nitrogen LaserPhysical Review Letters, 1974
- Dissociation Energy of F2The Journal of Chemical Physics, 1970