Hydrogenated amorphous carbon dielectric coatings for magneto-optic data storage media
- 1 November 1988
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 64 (9) , 4646-4650
- https://doi.org/10.1063/1.341244
Abstract
Thin films of hydrogenated amorphous carbon (a‐C:H) have been evaluated as quarter‐wave, antireflection dielectric coatings for application in magneto‐optic data storage media. The films, which are produced by plasma deposition from methane, have low optical absorption at 830 nm wavelength, high refractive index (n≊2.1), and provide enhancement of the polar Kerr rotation (θk) when used in conjunction with rare‐earth–transition‐metal (RE–TM), TbFe, or TbFeCo alloys. The chemical stability, inertness, and homogeneity of the carbon films makes them effective diffusion barriers to oxygen or water vapor and thus provides excellent protection against environmental oxidation of the RE–TM layer. Dynamic disk performance data show improved write sensitivity of the media when used with a‐C:H dielectric layers.This publication has 14 references indexed in Scilit:
- Properties of amorphous carbon films produced by magnetron sputteringThin Solid Films, 1984
- Composition and properties of the so-called “diamond-like” amorphous carbon filmsThin Solid Films, 1984
- Amorphous hard carbon films on polycarbonate substratesVacuum, 1984
- The growth of amorphous and graphitic carbon layers under ion bombardment in an rf plasmaVacuum, 1984
- Optical properties of "diamondlike" carbon films: An ellipsometric studyPhysical Review B, 1983
- Anomalous magnetoresistance of thin copper filmsSolid State Communications, 1982
- Thermopower of doped semiconducting hydrogenated amorphous carbon filmsSolid State Communications, 1982
- Properties of hydrogenated carbon films produced by reactive magnetron sputteringSolar Energy Materials, 1981
- The growth of carbon films with random atomic structure from ion impact damage in a hydrocarbon plasmaThin Solid Films, 1979
- Deposition of hard and insulating carbonaceous films on an r.f. target in a butane plasmaThin Solid Films, 1976