Effects of thin film deposition rates, and process-induced interfacial layers on the optical properties of plasma-deposited SiO2/Si3N4 Bragg reflectors
- 1 July 1993
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 11 (4) , 893-899
- https://doi.org/10.1116/1.578323
Abstract
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