Resist heating effects in 25 and 50 kV e-beam lithography on glass masks

• 1 November 1990
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B
• Vol. 8  (6) , 1898-1902
• https://doi.org/10.1116/1.585181

Abstract

Keywords

• BEAM LITHOGRAPHY
• GLASS MASKS
• HEATING EFFECTS
• RESIST HEATING