SPUTTERING WITH GAS CLUSTER-ION BEAMS
- 1 February 1996
- journal article
- conference paper
- Published by World Scientific Pub Co Pte Ltd in Surface Review and Letters
- Vol. 03 (01) , 1017-1021
- https://doi.org/10.1142/s0218625x96001820
Abstract
A high-current (~100 nA) cluster-ion-beam equipment with a new mass filter has been developed to study the energetic cluster-bombardment effects on solid surfaces. A dramatic reduction of Cu concentration on silicon surfaces has been achieved by 20-keV Ar cluster (N~3000) ion bombardment. The removal rate of Cu with cluster ions is two orders of magnitude higher than that with monomer ions. A significantly higher sputtering yield is expected for cluster-ion irradiation. An energetic cluster-ion beam is quite suitable for removal of metal.Keywords
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