Equipment Simulation of Selective Tungsten Deposition

Abstract
This paper presents the numerical modeling of a cold wall reactor for selective tungsten chemical vapor deposition. In a two dimensional simulation the mass and heat transfer equations were solved considering the five chemical species ,, , , and . Detailed models for multicomponent diffusion and for the autocatalytic tungsten nucleation process were implemented. Model results are in good agreement with experimental findings. The simulations are used to study the impact of reactor design on selectivity.