Excimer Laser Induced Etching of Silicon-Carbide
- 1 January 1988
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Selective interhalogen etching of tantalum compounds and other semiconductor materialsApplied Physics Letters, 1985
- Plasmaless dry etching of silicon with fluorine-containing compoundsJournal of Applied Physics, 1984
- Linear-Focused ArF Excimer Laser Beam for Depositing Hydrogenated Silicon FilmsPublished by Springer Nature ,1984
- Multiple‐Etchant Loading Effect and Silicon Etching in ClF3 and Related MixturesJournal of the Electrochemical Society, 1982